Japan Semiconductor Innovation 50     (T-2 1960s)

Kodak's negative-type photoresist, KPR, was widely used in fabrication of semiconductor devices in 1960s. TOKYO OHKA succeeded in the development of Japan's first negative-type photoresist, OMR-81, in 1968. It was adopted by many semiconductor manufactures in Japan. TOKYO OHKA developed Japan's first positive-type photoresist, OFPR-2 in 1972. The improved version, OFPR-800 was globally adopted in almost all 64K DRAM fabrication replacing Shipley's AZ-1350. Then, JSR, Shin-Etsu Chemical, FUJIFILM and other Japanese companies started production of photoresist. Today, these Japanese companies supply to more than 70% of world-wide photoresist demands,　substantially contributing to semiconductor industries in the world.

Photoresist

Quto from TOKUO OHKA KOGYO HP ©TOKYO OHKA KOGYO CO.,LTD

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